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Contents lists available at ScienceDirect
Sensors and Actuators B: Chemical
journal homepage: www.elsevier.com/locate/snb
New perspectives of gas sensor technology
Noboru Yamazoe, Kengo Shimanoe
∗
Faculty of Engineering Sciences, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580, Japan
article info
Article history:
Received 15 August 2008
Received in revised form 11 November 2008
Accepted 5 January 2009
Available online xxx
Paper presented at the International Meet-
ing of ChemicalSensors 2008 (IMCS-12), July
13–16, 2008, Columbus, OH, USA.
Keywords:
Semiconductor
Gas sensor
Oxide
Receptor
Depletion
MEMS
abstract
Two recent topics important for advancing gas sensor technology are introduced. Semiconductor gas
sensors have been developed so far on empirical bases but now a fundamental theory has been made
available for further developments. The theory reveals the roles of physical properties of semiconductors
and chemical properties of gases in the receptor function. MEMS techniques have been applied to fabri-
cation of micro-platforms for use in gas sensors. The micro-platforms appear to provide gas sensors with
new innovative function.
© 2009 Elsevier B.V. All rights reserved.
1. Introduction
Looking back its history, gas sensor technology was inaugurated
when three kinds of pioneering gas sensors were put in prac-
tice in Japan, i.e., oxide semiconductor gas sensors for gas leakage
alarms [1], solid electrolyte oxygen sensors for car emission control
systems [2], and ceramic humidity sensors for automatic cooking
ovens [3]. These sensors demonstrated dramatically how impor-
tant it was to monitor a specific gas species in situ, in real time
and continuously for ensuring safety from gas hazards, protecting
environments, or making home appliances intelligent or friendly
to users. Importance of such emerging technology was well recog-
nized world wide when the first International Meeting on Chemical
Sensors (IMCS) was held at Fukuoka, Japan, in 1983, under the lead-
ership of the late Professor Seiyama [4]. Research and development
was triggered off all over the world to seek new and/or better gas
sensors.
Currently various kinds of gases including reducing ones
(methane, propane, carbon monoxide, ammonia, hydrogen sulfide,
etc.) and adsorptive ones (oxygen, nitrogen dioxide, ozone, etc.)
have been made detectable with gas sensors using semiconduc-
tors, electrolytes or catalytic combustion. Yet there are various
new demands to gas sensors ranging from detecting VOCs (Volatile
∗
Corresponding author. Tel.: +81 92 583 7876; fax: +81 92 583 7538.
E-mail address: simanoe@mm.kyushu-u.ac.jp (K. Shimanoe).
Organic Compounds) at very low concentrations (ppb levels) to
constructing sensor network systems. Needless to say, even the
established gas sensors are demanded for innovations towards bet-
ter sensing performances, lower power consumption and more
compact device structures. To meet these demands, semiconduc-
tor gas sensors are considered to be best suited because they have
advantageous features such as simplicity in device structure and
circuitry, high sensitivity, versatility and robustness. It is pointed
out that most of the sensors in this group have been developed
empirically from a lack of theoretical understandings. Fortunately,
we recently succeeded in deriving theoretical equations to describe
the response of these sensors to adsorptive or reducing gases quan-
titatively [5–7]. We expect that the new theory will provide useful
guidelines on how to elaborate selection and processing of sens-
ing materials and additives used as well as device structure and
fabrication techniques to be used.
From such a standpoint, theory of semiconductor gas sensors is
introduced here as a main topic. Another topic, MEMS-assisted gas
sensors, is selected because those are likely to give rise to a new
breakthrough in gas sensor technology.
2. Theory of semiconductor gas sensors
2.1. Overview of empirical information and problems
Semiconductor gas sensors detect a specific target gas from
a change in the electric resistance of a sensing body which is a
0925-4005/$ – see front matter © 2009 Elsevier B.V. All rights reserved.
doi:10.1016/j.snb.2009.01.023
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Fig. 1. Three basic factors controlling semiconductor gas sensors.
porous assembly of tiny crystals (particles) of oxide semiconduc-
tors such as SnO
2
. Gas sensing properties have been accounted
for by three basic factors, namely, receptor function, transducer
function and utility factor, as schematically shown in Fig. 1 [6–10].
The first one is concerned with how each crystal responds to
the stimulant gas in problem, while the second does how the
response of each crystal is transduced into device resistance. The
third one describes how the device response (resistance change)
is attenuated in an actual porous sensing body due to a con-
sumption of the stimulant gas during its diffusion inside. Among
these factors, only the last one has been clarified theoretically
[9,10]. As for the receptor function, it is known that oxygen is
adsorbed on the crystals in air, presumably as O
−
,overthetem-
perature range of interest [11] to form a depletion layer in them.
Upon contact to a stimulant (H
2
), the oxygen adsorbates are con-
sumed more or less, causing the depletion layer to decrease. The
transducer function can also be easily understood qualitatively
based on the double Schottky barrier model so far assumed popu-
larly.
It is remarked, however, that the double Schottky barrier
model is nothing but estimated as an extension from other semi-
conductor devices. In fact, some sensor devices fabricated with
wet-coating techniques have been found to exhibit temperature-
independent resistance in air in disagreement with the model,
and tunneling transport of electrons between adjacent crystals
has b een strongly suggested instead [8]. The scheme of receptor
function above is also too qualitative, failing to account for many
pieces of experimental information including grain size effects on
sensitivity. Definitely quantitative approaches to the receptor func-
tion are badly neede d. This is a main concern here in the first
topic.
2.2. How to formulate receptor function
2.2.1. Scope of formulation
On each semiconductor crystal, adsorption and/or reactions of
gases take place to capture or release electrons, while a corre-
sponding redistribution of electrons takes place inside to achieve an
electrostatic equilibrium. The surface chemical affair and the sub-
surface physical one are not independent but united together, and
this provides a base on which the receptor function is formulated
as follows.
The chemical affair can be formulated easily. In an oxygen atmo-
sphere, for instance, oxygen adsorption is expressed as follows:
O
2
+ 2e = 2O
−
(R1)
(K
O2
P
O2
)
1/2
[e]
s
= [O
−
] (1)
Here K
O2
and P
O2
are adsorption constant and partial pressure of
oxygen, respectively, and [e]
s
and [O
−
] are surface densities of free
electrons and O
−
, respectively. In the presence of a reducing gas
(H
2
), O
−
is consumed by the reaction:
H
2
+ O
−
= H
2
O + e (R2)
By coupling with (R1), the following equation results in the steady
state:
K
O2
P
O2
[e]
s
2
= [O
−
]
2
+ cP
H2
[O
−
] (2)
P
H2
is partial pressure of H
2
, and c is a constant defined by c = k
2
/k
−1
,
where k
2
and k
−1
are rate constants of (R2) and reverse reaction
of (R1), respectively. Eqs. (1) and (2) combine between [e]
s
and
[O
−
] in the oxygen atmosphere in the absence and presence of H
2
,
respectively. Since the electrostatic equilibrium condition gives rise
to another interrelation between [e]
s
and [O
−
] as stated later, the
two variables can be determined uniquely if P
O2
, P
H2
and physical
parameters of semiconductor crystals are fixed.
2.2.2. Electrostatic equilibrium for large crystals
Let us consider electrostatic equilibrium inside a semiconductor
crystal. In case the crystal is large enough, depletion is limited in
the shallow region from the surface. We can assume a flat surface
for which the electrostatic equilibrium has been discussed well by
using an energy band diagram as shown in Fig. 2. A location in the
crystal is expressed by a depth from the surface, x. Under simplifying
conditions of complete ionization of donors, no tailing of electron
distribution, and no surface states other than O
−
, Poisson’s equation
Fig. 2. Potential energy diagram for depletion in a large semiconductor crystal. Here
qV(x) is the potential energy of electron, qV
s
surface potential energy of electron, x
distance from the surface, w depletion depth, E
c
conduction band edge, E
v
valence
band edge, and E
F
is the Fermi level.
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can be solved easily to give the following equations [5]:
qV
kT
=
1
2
x − w
L
D
2
(3)
qV
s
kT
=
1
2
w
L
D
2
(4)
[e]
s
= N
d
exp
−qV
s
kT
(5)
[O
−
] =
−Q
sc
q
= N
d
w (6)
Here, q is the elementary charge of electron, kT thermal energy,
V and V
s
electric potentials at depth x and surface, respectively,
w depletion depth, N
d
donor density, L
D
Debye length defined by
L
D
=(q
2
N
d
/εkT)
−1/2
(ε, permittivity), and Q
sc
is the surface charge
density. [e]
s
and [O
−
] are seen to be correlated implicitly through
w by Eqs. (4) through (6). By coupling these equations with (1) or
(2), [e]
s
and [O
−
] can be solved for given P
O2
and P
H2
.
2.2.3. Electrostatic equilibrium for small crystals
In case the crystal is small, we encounter two kinds of uncon-
ventional phenomena. First, depletion extends to cover the whole
crystal with increasing P
O2
, and what would happen thereafter?
Second, the solutions of Poisson’s equation become dependent on
the shape of crystal. These phenomena have important meanings
for actual semiconductor gas sensors, as discusse d later.
The first phenomenon is illustrated schematically in Fig. 3,
where three thin plates with thicknesses of l, l/2 and l/4 are exposed
to stepwise increasing partial pressures of oxygen, P
O2
(I), P
O2
(II) and
P
O2
(III). When depletion extends to l/4 from both surfaces for the
thickest plate at P
O2
(I), depletion just covers the whole region for
the l/2 thick plate, while the thinnest plate is put into a new type of
depletion. When depletion covers the whole region of the thickest
plate at P
O2
(II), the thinner plates are both in the new type deple-
tion. The new type depletion is seen to show up more easily (at
lower P
O2
) as the thickness is reduced or P
O2
is increased. The new
type depletion and the conventional type one are called here vol-
ume depletion and regional depletion, respectively, and the border
state is called boundary depletion.
Nature of volume depletion is easily understood from the dia-
grams of potential energy and electron distribution shown in Fig. 4,
where the one-dimensional coordinate, x, is redefined as a distance
from a center of the crystal (thickness 2a). The crystal is in the flat
band state at P
O2
= 0 as assume d. In the presence of oxygen (P
O2
(I)),
surface state (O
−
) is formed and depletion takes place from both
Fig. 3. Stages of depletion in thin semiconductor plates with three different thick-
nesses placed under three different partial pressures of oxygen.
Fig. 4. Potential energy diagram (a) and electron distribution diagram (b) for deple-
tion in a thin semiconductor plate.
sides of the plate to a depth at which an electronic equilibrium is
reached between bulk and the surface state (O
−
) (regional deple-
tion). Free electrons have been transferred from a shallow region as
shown in the electron distribution diagram, where a tailing effect
of distribution is taken into account. With increasing P
O2
, the sur-
face state (O
−
) shifts to lower energy and so depletion depth w
also increases until it reaches finally the center of the plate (w = a)
at P
O2
(II) (boundary depletion). For a further increase in P
O2
to
P
O2
(III), however, there is no room to extend w further. Instead
the location of Fermi l evel shifts down by an adequate quantity
(pkT), while keeping the potential energy profile the same as that
for P
O2
(II), to satisfy the new equilibrium (volume depletion). At
this stage, free electrons are squeezed out of the whole plate, as
seen from the electron distribution diagram. This is a reason why
it is named volume depletion. It is inferred that volume deple-
tion corresponds to Region III reported by Rothschild and Komen
[12,13].
The potential energy of electrons inside the plate is formulated
for each type of depletion as follows [6]:
qV
r
(x)
kT
=
1
2
x − (a − w)
L
D
2
(7)
qV
b
(x)
kT
= (1/2L
2
D
)x
2
(8)
qV
v
(x)
kT
= (1/2L
2
D
)x
2
+ p (9)
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Fig. 5. Potential energy diagram drawn relative to the flat band state.
Suffices r, b and v stand for regional, boundary and volume deple-
tion, respectively. Once the potential energy is known, [e]
s
can be
derived from (5). On the simple abrupt model (Fig. 2), [O
−
]isgiven
by (6). For more precise treatment, it should be modified to
[O
−
] = N
d
w{1 − A(a, w)} (10)
Here A(a, w) is a quantity to be corrected for non-ideal behavior
such as the tailing effect. Thus the two variables, [e]
s
and [O
−
], are
correlated implicitly by (9) and (10), and hence they are determined
uniquely by coupling these equations with (1) or (2).
The meaning of Fermi level shift, pkT, is worth being discussed.
Fig. 5 is a potential energy diagram redrawn relative to the flat band
state. On going from boundary depletion to volume one, the poten-
tial energy shifts up by pkT. The shift causes the surface potential
energy to increase and so causes [e]
s
to decrease correspondingly.
On the other hand, oxygen adsorption equilibrium (1) indicates that
an increase in P
O2
should be met by a change in [O
−
]/[e]
s
ratio.
In the stage of volume depletion, [O
−
] cannot increase so much
since most of conduction electrons available have been exhausted
already. That is, oxygen adsorption is controlled by a supply of elec-
trons. This means that the change in the above ratio is achieved
mainly by that in [e]
s
. Thus it can be stated that the Fermi level
shift plays a role to connect between the surface chemical equilib-
rium and the subsurface electrostatic equilibrium in the stage of
volume depletion.
Now we consider the second phenomenon, dependence on
the shape of crystals. Fig. 6 illustrates the coordinates sys-
tems conveniently selected for three shapes of crystals, i.e.,
one-dimensional coordinate (plate), three-dimensional spherical
coordinates (sphere) and three-dimensional columnar coordinates
(column). By choosing such coordinates systems, Poisson’s equation
can be simplified as follows:
d
2
V
dx
2
=
−qN
d
ε
(plate) (11)
1
r
2
d
dr
r
2
dV
dr
=−q
N
d
ε
(sphere) (12)
1
r
d
dr
r
dV
dr
=−q
N
d
ε
(column) (13)
The solution of (11) has already been shown as (7)–(9) for plates.
Similarly (12) and (13) can b e solved mathematically under the
same boundary conditions [6]. Thus [e]
s
and [O
−
] can also be deter-
mined uniquely for spheres and columns.
2.3. Response to oxygen and other stimulants
As so far mentioned, we can formulate receptor function theo-
retically. In order to visualize it, however, we need to transduce it
into device resistance (R). For this purpose, it is assumed that R is
proportional to [e]
s
, and that it follows the following equation:
R
R
0
=
[e]
s
N
d
= exp
−qV
s
kT
(14)
R
0
is device resistance at P
O2
= 0 (flat band state). Although R is
influenced by many factors other than the receptor function, those
factors are cancelled out for R/R
0
, which is called reduced resistance
hereafter.
For devices consisting of large crystals, R/R
0
is correlated with
P
O2
and P
H2
by the following equations.
In pure oxygen,
X = m exp
m
2
2
,
R
R
0
= exp
m
2
2
(15)
In oxygen mixed with H
2
,
X =
1 +
Y
m
1/2
exp
m
2
2
,
R
R
0
= exp
m
2
2
(16)
X is reduced adsorptive strength of oxygen defined as
X =(K
O2
P
O2
)
1/2
/L
D
, Y is reduced reactivity of H
2
defined as
Y = cP
H2
/N
d
L
D
(see (2) for c) and m is reduced depth of depletion
defined as m = w/L
D
. The correlations, obtained by numerical
calculations, explain the power laws governing the response to O
2
and H
2
, but no other important information relevant to sensing
properties can be drawn.
Fig. 6. Coordinates systems selected for plates, spheres and columns.
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Fig. 7. Correlations between reduced resistance (R/R
0
) and reduced adsorptive
strength of oxygen (X) for semiconductor spheres different in reduced size (n)as
drawn on logarithmic scales.
Situation becomes utterly different for devices using small crys-
tals. When the crystals are spheres of radius a, for example, the
following equations are derived for the response to oxygen.
For regional depletion,
X =
n
3
1 −
(n − m)
n
3
− A
S
(n, m)
exp
m
2
6
1 + 2
(n − m)
n
R
R
0
= exp
m
2
6
1 + 2
(n − m)
n
(17)
For volume depletion,
R
R
0
=
3
n
X +
3
n
A
S
(n, n)exp
n
2
6
=
3
a
(K
O2
P
O2
)
1/2
+ C
s
(n)(18)
Here n is reduced radius defined as n = a/L
D
and m is reduced depth
of depletion. A
S
(n, m) is a correction term for non-ideal behavior
such as the tailing effect. C
s
(n) is a constant fairly close to unity
for small n (<4). The correlation between R/R
0
and X shown by
(17) is implicit and non-linear, while R/R
0
is a linear function of
X or P
O2
as indicated by (18). The correlations given by these equa-
tions are drawn on logarithmic scales in Fig. 7, where n is varied
between 1 and 10. For large n (=10), regional depletion prevails over
a wide range of X up to about 10
8
, while its range deteriorates rather
sharply, being replaced by volume depletion, with decreasing n, and
it becomes practically invisible at n = 2. The meanings of the cor-
relations are made clearer in Fig. 8, where the same correlations
are drawn for a small range of X up to 150 on linear scales. Linear
correlations are obtained between R/R
0
and X for volume deple-
tion, with their slopes (sensitivity) being equal to 3/n, although
regional depletion is also visible for n > 3. Evidently this accounts
for the grain size effect on the response to oxygen. Similar discus-
sion can be made on the crystals of other shapes. For brevity, only
the correlations for volume depletion are compared below:
R
R
0
=
1
a
(K
O2
P
O2
)
1/2
+ C
p
(n) (plate) (19)
R
R
0
=
2
a
(K
O2
P
O2
)
1/2
+ C
c
(n) (column) (20)
R
R
0
=
3
a
(K
O2
P
O2
)
1/2
+ C
s
(n) (sphere) (18)
It is understood that the linearity constant (sensitivity) increases
to two or three times, on going from plates to columns or spheres.
This is nothing but indication of a shape effect on sensitivity. It
is worth stating that the linearity constants are in coincidence
with the surface area/volume ratios of the crystals of respective
shapes.
The response to H
2
in air can be treated similarly. Under the
condition that the rate of reaction (R2) is much faster than the rate
of desorption of O
−
, reduced resistance for a spherical crystal-based
device is given by
R
g
R
0
= N
1/2
d
(ac/3K
O2
P
O2
(air))
−1/2
P
−1/2
H2
(21)
Here R
g
is resistance under exposure to H
2
, P
O2
(air) is P
O2
in air, and
c has already been defined for (2). Conventionally defined response,
R
a
/R
g
(R
a
, resistance in air), is expressed as
R
a
R
g
=
Sc
aN
d
1/2
P
1/2
H2
(22)
S is shape factor and is allotted values of 1, 2 and 3 for plates,
columns and spheres, respectively. R
a
/R
g
is linear to the square root
of P
H2
(power law). Its slope (sensitivity) is determined by the sev-
eral physical and chemical parameters included in the parentheses.
To achieve high sensitivity, spherical crystals (S = 3) are best suited,
and a and N
d
should be reduced as much as possible. It is also under-
stood that selectivity among reducing gases is determined by their
reactivity (c) under these conditions.
The response to adsorptive gases can also be formulated, as
exemplified here for the case of NO
2
. Its adsorption is expressed as
NO
2
+ e = NO
2
−
(R3)
K
NO2
P
NO2
[e]
s
= [NO
2
−
] (23)
K
NO2
and P
NO2
are adsorption constant and partial pressure of NO
2
,
respectively, and [NO
2
−
] is surface density of NO
2
−
.NO
2
molecules
compete with O
2
to capture electrons so that formulation of the
response to NO
2
is fairly complex for the stage of regional deple-
tion. For volume depletion, in contrast, it is quite simple, reduced
Fig. 8. Redrawing of the same correlations in Fig. 7 on linear scales.
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resistance being expressed as
R
R
0
=
S
a
K
NO2
P
NO2
+
S
a
(K
O2
P
O2
)
1/2
+ C(n)(24)
S is shape factor, being 1, 2 and 3 for plates, columns and spheres,
respectively. C(n) is a small constant close to unity for small n.
Adsorption of NO
2
and O
2
is seen to contribute to reduced resis-
tance linearly as well as additively. Conventionally defined response
is given as
R
g
R
a
=
S
a
R
a
R
0
−1
K
NO2
P
NO2
+ 1 (25)
R
a
is device resistance in air in the absence of NO
2
. It is noted that
R
a
/R
0
cannot be derived from (24) since the condition of volume
depletion is not always satisfied in the absence of NO
2
. The response
is seen to be inversely proportional to a.
2.4. Applicability to experimental data
The theory developed above has been shown to be well con-
sistent with experimental data, though available data are still
limited at present. Here two examples are introduced. Fig. 9 is
a reproduction of the data showing grain size ef fects observed
with SnO
2
-based devices [14]. In the region of smaller grain sizes,
device resistances in air (R
a
) as well as the responses to H
2
or CO
(R
a
/R
g
) tend to increase sharply with decreasing size. Previously
we estimated that such behavior could be associated with deple-
tion of the whole region of each constituent grain. In the light of
the present theory, however, this estimation should be corrected
largely, though not totally wrong. First of all, it is shown that R
a
should be independent of grain sizes if volume depletion is assumed
to prevail. The sharp increase of R
a
observed can be attributed
instead to an increase in the number of grains without donors
(insulating grains). This can happen when the grain size (diameter)
is made smaller than an average separation between neighboring
donors under the condition of a fixed donor density (N
d
). From the
grain size value at which R
a
begins to increase, N
d
is estimated to
be 5.6 × 10
18
cm
−3
. This in turn leads to L
D
= 2.4 nm at 600 K, show-
ing that reduced sizes, n = a/L
D
, of the grains tested are between 5.4
(largest) and 0.9 (smallest). This range of n is consistent with the
assumption of volume depletion. From (22), the response to a fixed
Fig. 9. Dependence of device resistance in air (R
a
) and response to H
2
or CO in air
(R
a
/R
g
) on grain sizes of SnO
2
(diameter d) [16].
Fig. 10. Response data to H
2
or CO as correlated with a
−1/2
.
concentration of H
2
or CO should be proportional to a
−1/2
:
R
a
R
g
= (3cP
gas
/N
d
)
1/2
a
−1/2
(gas; H
2
or CO) (26)
The response data are plotted against a
−1/2
in Fig. 10. It is seen
that three data on the larger grains fall on a straight line passing
through origin in either cases of H
2
(A) and CO (B) in agreement
with (26), while the remaining data on the smaller grains deviate
upward probably through improvements of utility factor due to the
appearance of insulating grains. The ratio of the slopes of straight
lines, A/B, gives the ratio of reaction rate constants (k
2
)ofH
2
and
CO; k
2
of H
2
is analyzed to be 14 times as large as that of CO. Sim-
ilar H
2
response data obtained with Al-doped SnO
2
[15] are also
plotted in the same figure (C). The slope ratio, C/A, gives the ratio
of donor density (N
d
), which is analyzed to be 1/29. In this way,
the influences of a, k
2
and N
d
on the response can be accounted for
quantitatively.
Sensing behavior to NO
2
in air can be explained satisfactorily as
well. Sensitivity to NO
2
has been shown to be enhanced greatly with
decreasing grain size or lamella thickness for WO
3
-based devices,
as shown in Fig. 11 [16]. This is consistent quite well with (25),
which predicts sensitivity inversely proportional to grain size or
lamella thickness. As another typical feature, response behavior to
NO
2
is strongly dependent on operating temperature. As shown in
Fig. 12, the response is linear to concentrations of NO
2
down to
small concentration levels at a low temperature (200
◦
C). At higher
temperatures (300 and 400
◦
C), however, besides a decrease in sen-
sitivity, the response becomes non-linear in the region of smaller
concentrations, and the non-linear region grows more conspicuous
with increasing temperature. Notably even in these cases linearity
is maintained for the larger concentrations of NO
2
. Such behav-
ior is consistent with what is expected from the theory. At a low
temperature where adsorption constant (K
NO2
) is large enough to
fulfill the condition of volume depletion down to a small concen-
tration of NO
2
, the linearity holds seemingly over the whole range
of NO
2
concentrations according to (25). With increasing temper-
ature, K
NO2
is lowered to cause regional depletion to appear in a
range of smaller concentrations of NO
2
, while volume depletion
dominates at larger concentrations. This explains why the response
exhibits non-linear behavior followed by linear one at the higher
temperatures as observed as well as why linearity constant (sensi-
tivity) of the linear region decreases with increasing temperature. It
is worth noting that the dependence of response behavior on tem-
perature in Fig. 12 is very similar to that on reduced size (n)inFig. 8.
Please cite this article in press as: N. Yamazoe, K. Shimanoe, New perspectives of gas sensor technology, Sens. Actuators B: Chem. (2009),
doi:10.1016/j.snb.2009.01.023
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Fig. 11. Response data to NO
2
(1 ppm) in air at 200 and 300
◦
CforWO
3
-based devices
as correlated with grain size (diameter d) or lamella thickness (l).
In fact this similarity is rationalized because a decrease in K
NO2
is
equivalent to an increase in n.
3. MEMS-assisted gas sensors
An important technology called MEMS (Micro-Electro-
Mechanical System) was born about two decades ago. Since then,
it has been developed greatly for realizing various types of physical
Fig. 12. Response of a lamellar WO
3
-based device at three operating temperatures
as a function of NO
2
concentration.
Fig. 13. Structure and heating and cooling characteristic of a micro-platform [17].
sensors and actuators. Although gas sensors have no electro-
mechanical parts, micro-fabrication techniques elaborated for
MEMS can be transferred to gas sensors [17,18]. In recent years,
MEMS techniques have been gathering a strong focus in the field
of gas sensors, especially for the purpose of realizing a micro-
platform, suspended in a cavity of silicon for thermal insulation, on
which sensing materials are coated. One of the greatest difficulties
associated has been how to attain stably an operating temperature
high enough to secure gas sensing (up to 450–500
◦
C). After various
efforts, such micro-platforms have been realized. An example is
shown in Fig. 13 [19]. The platform, a square of about 100 min
width, is attached with a micro-heater and a pair of comb type
electrodes. On heating in a pulse mode of 100 ms on and 100 ms
off, device temperature changes rapidly between 450
◦
C and room
temperature, the high temperature being stabilized in as short as
30 ms after switching on, as shown. Such an excellent characteristic
is granted by elaborating the platform design with regard to heater
conductance, heat capacitance, insulation of heat, and so on.
Micro-platforms are expected to provide gas sensors with var-
ious benefits. First, power consumption can be reduced drastically,
especially through a pulse-mode heating operation with a small
duty ratio. By saving power consumption, sensor devices can be
made drivable with a battery, which is beneficial to cordless or
portable gas sensors. For example, realization of battery-driven
gas sensors durable for 5 years without charge is planned for
installation in houses and vehicles. Second, sensor devices can
be miniaturized drastically. Coupled with the small power con-
sumption, this feature makes the devices easier to install in a
small space and so more appropriate to apply for various new
ubiquitous sensor systems. Third, the excellent heating and cooling
characteristics can provide gas sensors with new functions. For
example, it is possible to scan operating temperature stepwise in
a short time. Probably response data at 10 different temperatures
will be acquired within a few seconds, and the resulting response
vs. temperature profile will be a useful tool to identify the gaseous
component(s) in problem. False alarming will thus be eliminated
Please cite this article in press as: N. Yamazoe, K. Shimanoe, New perspectives of gas sensor technology, Sens. Actuators B: Chem. (2009),
doi:10.1016/j.snb.2009.01.023
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Fig. 14. Structure of adsorption–combustion type VOC sensor (a) and sensing capability to toluene gas achieved (b).
effectively. The same characteristics will facilitate to introduce use-
ful analytical techniques such as condensation and extraction into
gas sensing. This is exemplified well by the adsorption–combustion
type VOC sensor developed recently [20]. A catalytic combustion
type sensor fabricated on twin micro-platforms (Fig. 14) is oper-
ated in a mode of pulse heating (for 0.4 s) and off or low power
heating (for 9.6 s). VOCs are adsorbed and accumulated on the
catalyst layer during the off- or low power heating-period. Those
adsorbates are subjected to catalytic combustion during the pulse
heating period. If the sensor response is continuously monitored,
the concentration of VOCs surrounding the sensor can be estimated
from the response peak height. It is recognized that the key of
this sensor is possessed by the condensation of VOCs through
adsorption. By optimizing the temperature of adsorption, the
sensor can detect as low as 10 ppb toluene in air, as shown.
As mentioned above, gas sensors are expected to be inno-
vated greatly by the use of micro-platforms. However, there are
great tasks to be cleared before the innovated sensors are com-
mercialized. One of such tasks is to establish micro-fabrication
techniques to deposit a well-qualified sensing layer efficiently on
micro-platforms. Micro-characterization methods should also be
established.
4. Conclusions
Gas sensors will ever continue to b e requested for further
advancements i n the future as a key to solve or control various
problems associated with gases. In this regard, particularly semi-
conductor gas sensors which have pioneered gas sensor technology
have to be innovated further. The sensors of this group have been
developed successfully mostly on empirical bases thanks to the
excellence of the sensing properties oxide semiconductors intrinsi-
cally possess, but further developments seem to be difficult without
theoretical supports. Fortunately, a theory dealing with the recep-
tor function of these sensors was proposed recently. The theory was
derived by combining together the chemical affairs taking place on
the surface of individual semiconductor crystals and the physical
affairs inside. It reveals the important roles played by the chemical
parameters of gases (adsorption constants and reaction rate con-
stants) as well as the physical parameters of semiconductor crystals
(grain size, grain shape and donor density). The theory is expected
not only to facilitate fundamental understandings but also to give
rise to a breakthrough in the design and processing of materials
toward innovations of gas sensors.
Micro-platforms fabricated with MEMS techniques are almost
ready to be used in gas sensors. Excellent heating and cooling char-
acteristics of them are expected to provide gas sensors with new
innovative functions toward realization of various next-generation
sensors.
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Biographies
Noboru Yamazoe has been a professor at Kyushu University since 1981 until he
retired in 2004. He received his BE degree in applied chemistry in 1963 and PhD
in engineering in 1969 from Kyushu University. His research interests include the
development and application of the functional inorganic materials.
Kengo Shimanoe has been a professor at Kyushu University since 2005. He received
his BE degree in applied chemistry in 1983 and ME degree in 1985 from Kagoshima
University and Kyushu University, respectively. He joined the advanced materials
and technology laboratory in Nippon Steel Corp. and studied the electronic charac-
terization on semiconductor surface and the electrochemical reaction on materials
to 1995. He received PhD in engineering in 1993 from Kyushu University. His cur-
rent research interests include the development of gas sensors and other functional
devices.
. new
breakthrough in gas sensor technology.
2. Theory of semiconductor gas sensors
2.1. Overview of empirical information and problems
Semiconductor gas sensors detect. history, gas sensor technology was inaugurated
when three kinds of pioneering gas sensors were put in prac-
tice in Japan, i.e., oxide semiconductor gas sensors
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